DocumentCode
3380592
Title
Electrical and chemical characterization of chemically passivated silicon surfaces
Author
Chhabra, Bhumika ; Suzer, Sefik ; Opila, Robert L. ; Honsberg, Christiana B.
Author_Institution
Department of Material Science & Engineering, University of Delaware, Newark, 19716-3140, USA
fYear
2008
fDate
11-16 May 2008
Firstpage
1
Lastpage
4
Abstract
The surface composition of chemically passivated silicon substrates is investigated using XPS and FTIR techniques. The samples are passivated with methanol, quinhydrone-methanol and iodine-methanol solution after HF treatment. The minority carrier lifetimes of these chemically passivated silicon substrates are also measured. Quinhydrone-methanol solution provides a chemically inert surface and a considerably longer minority carrier lifetime.
Keywords
Chemicals; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
Conference_Location
San Diego, CA, USA
ISSN
0160-8371
Print_ISBN
978-1-4244-1640-0
Electronic_ISBN
0160-8371
Type
conf
DOI
10.1109/PVSC.2008.4922673
Filename
4922673
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