DocumentCode :
3381317
Title :
Reliability testing of AlGaN/GaN HEMTs under multiple stressors
Author :
Christiansen, Bradley D. ; Coutu, Ronald A., Jr. ; Heller, Eric R. ; Poling, Brian S. ; Via, G. David ; Vetury, Rama ; Shealy, Jeffrey B.
Author_Institution :
Dept. of Electr. & Comput. Eng., Air Force Inst. of Technol., Wright-Patterson AFB, OH, USA
fYear :
2011
fDate :
10-14 April 2011
Abstract :
We performed an experiment on AlGaN/GaN HEMTs with high voltage and high power as stressors. We found that devices tested under high power generally degraded more than those tested under high voltage. In particular, the high-voltage-tested devices did not degrade significantly as suggested by some papers in the literature. The same papers in the literature also suggest that high voltages cause cracks and pits. However, the high-voltage-tested devices in this study do not exhibit cracks or pits in TEM images, while the high-power-tested devices exhibit pits.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device reliability; semiconductor device testing; transmission electron microscopy; wide band gap semiconductors; AlGaN-GaN; HEMT; TEM images; cracks; high power tested devices; high-voltage-tested devices; multiple stressors; pits; reliability testing; Aluminum gallium nitride; Degradation; Gallium nitride; HEMTs; Logic gates; MODFETs; Testing; GaN; failure mechanisms; high electron mobility transistor (HEMT); reliability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium (IRPS), 2011 IEEE International
Conference_Location :
Monterey, CA
ISSN :
1541-7026
Print_ISBN :
978-1-4244-9113-1
Electronic_ISBN :
1541-7026
Type :
conf
DOI :
10.1109/IRPS.2011.5784556
Filename :
5784556
Link To Document :
بازگشت