• DocumentCode
    3381317
  • Title

    Reliability testing of AlGaN/GaN HEMTs under multiple stressors

  • Author

    Christiansen, Bradley D. ; Coutu, Ronald A., Jr. ; Heller, Eric R. ; Poling, Brian S. ; Via, G. David ; Vetury, Rama ; Shealy, Jeffrey B.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Air Force Inst. of Technol., Wright-Patterson AFB, OH, USA
  • fYear
    2011
  • fDate
    10-14 April 2011
  • Abstract
    We performed an experiment on AlGaN/GaN HEMTs with high voltage and high power as stressors. We found that devices tested under high power generally degraded more than those tested under high voltage. In particular, the high-voltage-tested devices did not degrade significantly as suggested by some papers in the literature. The same papers in the literature also suggest that high voltages cause cracks and pits. However, the high-voltage-tested devices in this study do not exhibit cracks or pits in TEM images, while the high-power-tested devices exhibit pits.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device reliability; semiconductor device testing; transmission electron microscopy; wide band gap semiconductors; AlGaN-GaN; HEMT; TEM images; cracks; high power tested devices; high-voltage-tested devices; multiple stressors; pits; reliability testing; Aluminum gallium nitride; Degradation; Gallium nitride; HEMTs; Logic gates; MODFETs; Testing; GaN; failure mechanisms; high electron mobility transistor (HEMT); reliability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium (IRPS), 2011 IEEE International
  • Conference_Location
    Monterey, CA
  • ISSN
    1541-7026
  • Print_ISBN
    978-1-4244-9113-1
  • Electronic_ISBN
    1541-7026
  • Type

    conf

  • DOI
    10.1109/IRPS.2011.5784556
  • Filename
    5784556