DocumentCode
3381317
Title
Reliability testing of AlGaN/GaN HEMTs under multiple stressors
Author
Christiansen, Bradley D. ; Coutu, Ronald A., Jr. ; Heller, Eric R. ; Poling, Brian S. ; Via, G. David ; Vetury, Rama ; Shealy, Jeffrey B.
Author_Institution
Dept. of Electr. & Comput. Eng., Air Force Inst. of Technol., Wright-Patterson AFB, OH, USA
fYear
2011
fDate
10-14 April 2011
Abstract
We performed an experiment on AlGaN/GaN HEMTs with high voltage and high power as stressors. We found that devices tested under high power generally degraded more than those tested under high voltage. In particular, the high-voltage-tested devices did not degrade significantly as suggested by some papers in the literature. The same papers in the literature also suggest that high voltages cause cracks and pits. However, the high-voltage-tested devices in this study do not exhibit cracks or pits in TEM images, while the high-power-tested devices exhibit pits.
Keywords
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device reliability; semiconductor device testing; transmission electron microscopy; wide band gap semiconductors; AlGaN-GaN; HEMT; TEM images; cracks; high power tested devices; high-voltage-tested devices; multiple stressors; pits; reliability testing; Aluminum gallium nitride; Degradation; Gallium nitride; HEMTs; Logic gates; MODFETs; Testing; GaN; failure mechanisms; high electron mobility transistor (HEMT); reliability;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium (IRPS), 2011 IEEE International
Conference_Location
Monterey, CA
ISSN
1541-7026
Print_ISBN
978-1-4244-9113-1
Electronic_ISBN
1541-7026
Type
conf
DOI
10.1109/IRPS.2011.5784556
Filename
5784556
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