Title :
The Effect of Substrate Doping on the Behaviour of a CMOS Electrothermal Frequency-Locked-Loop
Author :
Zhang, C. ; Makinwa, K.A.A.
Author_Institution :
Delft Univ. of Technol., Delft
Abstract :
A CMOS electrothermal frequency-locked-loop (FLL) is presented, whose output frequency is determined by the temperature-dependent thermal diffusivity of the silicon substrate. Measurements show that this temperature dependence is essentially process independent. After a batch calibration, the electrothermal FLL has an untrimmed inaccuracy of less than plusmn0.7degC (3sigma) over the temperature range -40degC to 100degC.
Keywords :
CMOS integrated circuits; frequency locked loops; thermal diffusion; CMOS electrothermal frequency-locked-loop; batch calibration; silicon substrate; substrate doping effect; temperature-dependent thermal diffusivity; Aluminum; Doping; Electrothermal effects; Filters; Frequency locked loops; Silicon; Temperature dependence; Temperature sensors; Thermal sensors; Voltage-controlled oscillators; Electrothermal FLL; Electrothermal filter; Thermal diffusivity;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location :
Lyon
Print_ISBN :
1-4244-0842-3
Electronic_ISBN :
1-4244-0842-3
DOI :
10.1109/SENSOR.2007.4300625
