Title :
Challenges and strategies in advanced CMOS technology development
Author_Institution :
Semicond. R&D Center, IBM, Hopewell Junction, NY, USA
Abstract :
The ongoing drive for increased speed and density of CMOS technology requires the continuous innovation of advanced elements and processes. With the development of new materials also comes new manufacturing challenges. In this paper, we will give an overview on the technology and process challenges, innovation roadmap, and manufacturability strategies. We will also discuss the importance of collaboration in the CMOS business model.
Keywords :
CMOS integrated circuits; innovation management; semiconductor device manufacture; CMOS business model; CMOS technology development; innovation roadmap; manufacturability strategy; Business; Epitaxial growth; Implants; Metals; Monitoring; Strain;
Conference_Titel :
ASIC (ASICON), 2011 IEEE 9th International Conference on
Conference_Location :
Xiamen
Print_ISBN :
978-1-61284-192-2
Electronic_ISBN :
2162-7541
DOI :
10.1109/ASICON.2011.6157213
