DocumentCode :
3382405
Title :
Analysis of recoverable and non-recoverable NBTI and PBTI using AC and DC stresses
Author :
Monsieur, Frederic ; Cartier, Eduard ; Stathis, James
Author_Institution :
STMicroelectronics, Albany Nanotech, Albany, NY, USA
fYear :
2011
fDate :
10-14 April 2011
Abstract :
Much effort continues to be devoted to the modeling of the NBTI and PBTI instabilities in MOSFETs. This paper is dedicated to linking both equations in order to extract important physical information from the basic experimental parameters Ar and Br. We will show that both NBTI and PBTI behave very similarly. They both show permanent and recoverable traps. The recovery rate is a good estimator of the amount of recoverable traps enabling to decouple smartly both kinds of traps.
Keywords :
MOSFET; semiconductor device models; AC stresses; DC stresses; MOSFET; NBTI analysis; PBTI analysis; Argon; Correlation; Data mining; Fitting; Logic gates; Stress; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium (IRPS), 2011 IEEE International
Conference_Location :
Monterey, CA
ISSN :
1541-7026
Print_ISBN :
978-1-4244-9113-1
Electronic_ISBN :
1541-7026
Type :
conf
DOI :
10.1109/IRPS.2011.5784608
Filename :
5784608
Link To Document :
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