DocumentCode
3383008
Title
N type multicrystalline silicon wafers from an upgraded metallurgical route
Author
Martinuzzi, S. ; Trassy, C. ; Perichaud, I. ; Degoulange, J.
Author_Institution
UMR TECSEN CNRS-University Paul Cezanne-Aix-Marseille III - France
fYear
2008
fDate
11-16 May 2008
Firstpage
1
Lastpage
5
Abstract
N-type silicon wafers present some definite advantages for photovoltaics, mainly due to the low capture cross sections of minority carriers for most metallic impurities. This peculiarity is beneficial for multicrystalline silicon (mc-Si) wafers. Most importantly, this peculiarity could be of a great interest when mc-Si ingots are produced directly from upgraded and purified metallurgical silicon feedstock. It is of a paramount importance to verify if the advantages of conventional n-type silicon also characterises n-type wafers provided by the direct metallurgical route. It is found, in raw wafers, that minority carrier diffusion lengths are 3 times higher in n-type than in p-type wafers, when the wafers are cut from the same ingot, which the bottom is p- type and the top is n-type. The results confirm the interest for n type silicon.
Keywords
Chemical analysis; Crystalline materials; Impurities; Optical materials; Photovoltaic cells; Plasma applications; Plasma materials processing; Purification; Silicon; Spectroscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
Conference_Location
San Diego, CA, USA
ISSN
0160-8371
Print_ISBN
978-1-4244-1640-0
Electronic_ISBN
0160-8371
Type
conf
DOI
10.1109/PVSC.2008.4922790
Filename
4922790
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