• DocumentCode
    3383008
  • Title

    N type multicrystalline silicon wafers from an upgraded metallurgical route

  • Author

    Martinuzzi, S. ; Trassy, C. ; Perichaud, I. ; Degoulange, J.

  • Author_Institution
    UMR TECSEN CNRS-University Paul Cezanne-Aix-Marseille III - France
  • fYear
    2008
  • fDate
    11-16 May 2008
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    N-type silicon wafers present some definite advantages for photovoltaics, mainly due to the low capture cross sections of minority carriers for most metallic impurities. This peculiarity is beneficial for multicrystalline silicon (mc-Si) wafers. Most importantly, this peculiarity could be of a great interest when mc-Si ingots are produced directly from upgraded and purified metallurgical silicon feedstock. It is of a paramount importance to verify if the advantages of conventional n-type silicon also characterises n-type wafers provided by the direct metallurgical route. It is found, in raw wafers, that minority carrier diffusion lengths are 3 times higher in n-type than in p-type wafers, when the wafers are cut from the same ingot, which the bottom is p- type and the top is n-type. The results confirm the interest for n type silicon.
  • Keywords
    Chemical analysis; Crystalline materials; Impurities; Optical materials; Photovoltaic cells; Plasma applications; Plasma materials processing; Purification; Silicon; Spectroscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4244-1640-0
  • Electronic_ISBN
    0160-8371
  • Type

    conf

  • DOI
    10.1109/PVSC.2008.4922790
  • Filename
    4922790