• DocumentCode
    3384261
  • Title

    Emitter wrap-through structure for rear-side contacting of epitaxial thin-film solar cells

  • Author

    Mitchell, Emily J. ; Reber, Stefan

  • Author_Institution
    Fraunhofer Institute for Solar Energy Systems, Heidenhofstr. 2, 79110 Freiburg, Germany
  • fYear
    2008
  • fDate
    11-16 May 2008
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    The Epitaxy Wrap-through (EpiWT) cell concept is introduced. It combines the benefits of rear-side contacting with the low-cost potential of epitaxial crystalline silicon thin-film technology. Its advantage over the standard EWT cell upon which it is based is the simplified rear structuring due to the inactive substrate. This paper focuses on the development of the key process: the epitaxial deposition of the base and emitter layers through via holes in the substrate. Samples have been produced and characterised using cross-sections, spreading resistance profiling, conductance-type testing and defect etching. The deposition technique and methods of controlling and optimising the process are discussed.
  • Keywords
    Crystallization; Epitaxial growth; Etching; Optimization methods; Photovoltaic cells; Semiconductor thin films; Silicon; Substrates; Testing; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4244-1640-0
  • Electronic_ISBN
    0160-8371
  • Type

    conf

  • DOI
    10.1109/PVSC.2008.4922853
  • Filename
    4922853