DocumentCode
3384261
Title
Emitter wrap-through structure for rear-side contacting of epitaxial thin-film solar cells
Author
Mitchell, Emily J. ; Reber, Stefan
Author_Institution
Fraunhofer Institute for Solar Energy Systems, Heidenhofstr. 2, 79110 Freiburg, Germany
fYear
2008
fDate
11-16 May 2008
Firstpage
1
Lastpage
5
Abstract
The Epitaxy Wrap-through (EpiWT) cell concept is introduced. It combines the benefits of rear-side contacting with the low-cost potential of epitaxial crystalline silicon thin-film technology. Its advantage over the standard EWT cell upon which it is based is the simplified rear structuring due to the inactive substrate. This paper focuses on the development of the key process: the epitaxial deposition of the base and emitter layers through via holes in the substrate. Samples have been produced and characterised using cross-sections, spreading resistance profiling, conductance-type testing and defect etching. The deposition technique and methods of controlling and optimising the process are discussed.
Keywords
Crystallization; Epitaxial growth; Etching; Optimization methods; Photovoltaic cells; Semiconductor thin films; Silicon; Substrates; Testing; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
Conference_Location
San Diego, CA, USA
ISSN
0160-8371
Print_ISBN
978-1-4244-1640-0
Electronic_ISBN
0160-8371
Type
conf
DOI
10.1109/PVSC.2008.4922853
Filename
4922853
Link To Document