• DocumentCode
    3384518
  • Title

    Silicon nanowire photovoltaics

  • Author

    Tham, D. ; Heath, J.R.

  • Author_Institution
    Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, 91125, USA
  • fYear
    2008
  • fDate
    11-16 May 2008
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Arrays of hundreds of parallel silicon nanowire p-n junction diodes, 20 nm in diameter and separated from each other by 14 nm, were fabricated using a variant of nanoimprint lithography. Bulk film diodes were also fabricated adjacent to the arrays as controls. Dark I–V curves from the nanowire arrays and bulk films suggest that performance is currently limited by surface states.
  • Keywords
    Costs; Diodes; Hot carriers; Lattices; Optical scattering; Particle scattering; Phonons; Photonic band gap; Photovoltaic cells; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4244-1640-0
  • Electronic_ISBN
    0160-8371
  • Type

    conf

  • DOI
    10.1109/PVSC.2008.4922863
  • Filename
    4922863