DocumentCode :
3385251
Title :
Large diameter germanium wafers for CPV applications
Author :
Laureyn, Wim ; Geens, Wim ; Romandic, Igor ; Seghers, Geert ; Dessein, Kristof ; Quaeyhaegens, Carl
Author_Institution :
Umicore, Electro-Optic Materials, Watertorenstraat 33, B-2250 Olen, Belgium
fYear :
2008
fDate :
11-16 May 2008
Firstpage :
1
Lastpage :
3
Abstract :
Umicore has a long tradition in supplying germanium wafers to the space solar cell market. The main product for this application up to today is a substrate with a diameter of 100 mm and a thickness in the range of 140 – 180 ¼m. With the new emerging market of high-efficiency concentrator photovoltaics (CPV) the need has arisen to investigate the use of germanium wafers with a larger diameter. Especially for small size CPV cells, increasing the wafer diameter will significantly reduce the processing cost per die, which will also contribute to lowering the overall cost/kWh of CPV technology. In this paper the development of dislocation free 150 mm germanium wafers for CPV applications is presented. Different wafer thicknesses down to 200 ¼m have been realized. The process steps starting from crystal pulling up to final epi-cleaning and drying will be addressed. First measurement results on wafer level are shown as well. Finally, the future challenges in optimizing the 150 mm wafer specifications will be reviewed.
Keywords :
Chemical lasers; Cleaning; Conductivity; Costs; Germanium; III-V semiconductor materials; Microelectronics; Photovoltaic cells; Production; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
Conference_Location :
San Diego, CA, USA
ISSN :
0160-8371
Print_ISBN :
978-1-4244-1640-0
Electronic_ISBN :
0160-8371
Type :
conf
DOI :
10.1109/PVSC.2008.4922901
Filename :
4922901
Link To Document :
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