• DocumentCode
    3385768
  • Title

    An unified GSMBE growth model for GaInAsP on InP and GaAs

  • Author

    Liu, Jin-Shung ; Lee, Tsuen-Lin ; Lin, Hao-Hsiung

  • Author_Institution
    Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
  • fYear
    1996
  • fDate
    21-25 Apr 1996
  • Firstpage
    533
  • Lastpage
    536
  • Abstract
    A GaInAsP GSMBE growth model considering an intermediate state is presented. This model is very simple and needs only two fitting parameters, kIn and kGa, which are determined from the experimental results of In1-xGaxAsyP1-y on InP (0<x<0.47 and 0<y<1) and In1-xGaxAs yP1-y on GaAs (0.51<x<1 and 0<y<1). At a growth temperature of 480°C, they are 27.5 and 2.75, respectively. Their temperature dependency, i.e., activation energies are -27.5 and -457 meV, respectively. The average lattice mismatch difference between the theoretical and experimental results of grown epilayers is less than 7×10-4
  • Keywords
    III-V semiconductors; chemical beam epitaxial growth; gallium arsenide; gallium compounds; indium compounds; semiconductor growth; 480 degC; GaAs; GaInAsP; InP; activation energies; epilayers; growth temperature; intermediate state; lattice mismatch difference; unified GSMBE growth model; Chemicals; Equations; FAA; Gallium arsenide; Indium phosphide; Lattices; Molecular beam epitaxial growth; Solids; Substrates; Temperature control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1996. IPRM '96., Eighth International Conference on
  • Conference_Location
    Schwabisch-Gmund
  • Print_ISBN
    0-7803-3283-0
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1996.492301
  • Filename
    492301