DocumentCode :
3385768
Title :
An unified GSMBE growth model for GaInAsP on InP and GaAs
Author :
Liu, Jin-Shung ; Lee, Tsuen-Lin ; Lin, Hao-Hsiung
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fYear :
1996
fDate :
21-25 Apr 1996
Firstpage :
533
Lastpage :
536
Abstract :
A GaInAsP GSMBE growth model considering an intermediate state is presented. This model is very simple and needs only two fitting parameters, kIn and kGa, which are determined from the experimental results of In1-xGaxAsyP1-y on InP (0<x<0.47 and 0<y<1) and In1-xGaxAs yP1-y on GaAs (0.51<x<1 and 0<y<1). At a growth temperature of 480°C, they are 27.5 and 2.75, respectively. Their temperature dependency, i.e., activation energies are -27.5 and -457 meV, respectively. The average lattice mismatch difference between the theoretical and experimental results of grown epilayers is less than 7×10-4
Keywords :
III-V semiconductors; chemical beam epitaxial growth; gallium arsenide; gallium compounds; indium compounds; semiconductor growth; 480 degC; GaAs; GaInAsP; InP; activation energies; epilayers; growth temperature; intermediate state; lattice mismatch difference; unified GSMBE growth model; Chemicals; Equations; FAA; Gallium arsenide; Indium phosphide; Lattices; Molecular beam epitaxial growth; Solids; Substrates; Temperature control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1996. IPRM '96., Eighth International Conference on
Conference_Location :
Schwabisch-Gmund
Print_ISBN :
0-7803-3283-0
Type :
conf
DOI :
10.1109/ICIPRM.1996.492301
Filename :
492301
Link To Document :
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