DocumentCode
3385768
Title
An unified GSMBE growth model for GaInAsP on InP and GaAs
Author
Liu, Jin-Shung ; Lee, Tsuen-Lin ; Lin, Hao-Hsiung
Author_Institution
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fYear
1996
fDate
21-25 Apr 1996
Firstpage
533
Lastpage
536
Abstract
A GaInAsP GSMBE growth model considering an intermediate state is presented. This model is very simple and needs only two fitting parameters, kIn and kGa, which are determined from the experimental results of In1-xGaxAsyP1-y on InP (0<x<0.47 and 0<y<1) and In1-xGaxAs yP1-y on GaAs (0.51<x<1 and 0<y<1). At a growth temperature of 480°C, they are 27.5 and 2.75, respectively. Their temperature dependency, i.e., activation energies are -27.5 and -457 meV, respectively. The average lattice mismatch difference between the theoretical and experimental results of grown epilayers is less than 7×10-4
Keywords
III-V semiconductors; chemical beam epitaxial growth; gallium arsenide; gallium compounds; indium compounds; semiconductor growth; 480 degC; GaAs; GaInAsP; InP; activation energies; epilayers; growth temperature; intermediate state; lattice mismatch difference; unified GSMBE growth model; Chemicals; Equations; FAA; Gallium arsenide; Indium phosphide; Lattices; Molecular beam epitaxial growth; Solids; Substrates; Temperature control;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 1996. IPRM '96., Eighth International Conference on
Conference_Location
Schwabisch-Gmund
Print_ISBN
0-7803-3283-0
Type
conf
DOI
10.1109/ICIPRM.1996.492301
Filename
492301
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