DocumentCode :
3387144
Title :
Real case study of SWEAT EM test on via/line structure as process reliability monitor methodology
Author :
Andrew, K. L Yap ; Lim, Bee Hoon ; Yap, H.K. ; Tan, Y.C. ; Lo, K.F.
fYear :
2002
fDate :
21-24 Oct. 2002
Firstpage :
165
Lastpage :
167
Abstract :
SWEAT (Standard Wafer-level Electromigration Acceleration Test) is one of the various rapid electromigration test techniques proposed for quick monitoring of metal interconnect reliability performance in production line. We have successfully applied the SWEAT test on via/line structure to monitor and screen maverick or defective lots in production. In this work, we present real case studies to illustrate SWEAT test effectiveness as reliability screens and monitor.
Keywords :
electromigration; integrated circuit interconnections; integrated circuit reliability; integrated circuit testing; process monitoring; SWEAT EM test; metal interconnect; process reliability monitoring; standard wafer-level electromigration acceleration test; via/line structure; Computer aided software engineering; Electromigration; Life estimation; Monitoring; Production; Semiconductor device testing; Software testing; Stress; System testing; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 2002. IEEE International
Print_ISBN :
0-7803-7558-0
Type :
conf
DOI :
10.1109/IRWS.2002.1194259
Filename :
1194259
Link To Document :
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