DocumentCode :
3387813
Title :
Advances in excimer laser surface processing of materials
Author :
Jervis, T.R. ; Nastasi, M. ; Hirvonen, J.-P.
Author_Institution :
Div. of Mater. Sci. & Technol., Los Alamos Nat. Lab., NM, USA
fYear :
1996
fDate :
5-9 Aug. 1996
Firstpage :
38
Lastpage :
39
Abstract :
The use of pulsed excimer lasers to surface processing of materials hinges on an understanding of the nature of the interaction between the laser energy and the material. One of the advantages of excimer laser processing is the relative uniformity of that interaction across diverse materials. The short wavelength, (200-400 nm depending on the laser gas) and the short pulse length (30 ns) mean that for most materials, the energy is absorbed in a region of the surface that is shallow (10 nm) relative to the thermal diffusion length (100 nm) in the material.
Keywords :
excimer lasers; laser materials processing; surface treatment; 10 nm; 200 to 400 nm; 30 ns; excimer laser processing; excimer laser surface processing; laser energy; materials; pulsed excimer lasers; short pulse length; surface processing; thermal diffusion length; Chromium; Cooling; Gas lasers; Kinetic theory; Laser theory; Optical materials; Optical pulses; Surface emitting lasers; Surface resistance; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Applications of Lasers in Materials Processing/Broadband Optical Networks/Smart Pixels/Optical MEMs and Their Applications. IEEE/LEOS 1996 Summer Topical Meetings:
Conference_Location :
Keystone, CO, USA
Print_ISBN :
0-7803-3175-3
Type :
conf
DOI :
10.1109/LEOSST.1996.540669
Filename :
540669
Link To Document :
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