Title :
Effects of defect propagation/growth on in-line defect based yield prediction
Author :
Nurani, Raman K. ; Strojwas, Andrzej J. ; Shindo, Wataru
Author_Institution :
KLA-Tencor Corp., San Jose, CA, USA
Abstract :
This paper discusses the importance of understanding and modeling the inter and intra layer defect propagation for in-line yield prediction. Some examples using real fabline data are presented to illustrate the significance of this problem
Keywords :
inspection; integrated circuit yield; IC manufacture; defect growth; defect propagation; in-line defect based yield prediction; interlayer propagation; intralayer propagation; Area measurement; Data mining; Flowcharts; Inspection; Job shop scheduling; Manufacturing processes; Parametric statistics; Predictive models; Semiconductor device modeling; Yield estimation;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1997. IEEE/SEMI
Conference_Location :
Cambridge, MA
Print_ISBN :
0-7803-4050-7
DOI :
10.1109/ASMC.1997.630711
