DocumentCode
3387986
Title
Effects of defect propagation/growth on in-line defect based yield prediction
Author
Nurani, Raman K. ; Strojwas, Andrzej J. ; Shindo, Wataru
Author_Institution
KLA-Tencor Corp., San Jose, CA, USA
fYear
1997
fDate
10-12 Sep 1997
Firstpage
84
Lastpage
86
Abstract
This paper discusses the importance of understanding and modeling the inter and intra layer defect propagation for in-line yield prediction. Some examples using real fabline data are presented to illustrate the significance of this problem
Keywords
inspection; integrated circuit yield; IC manufacture; defect growth; defect propagation; in-line defect based yield prediction; interlayer propagation; intralayer propagation; Area measurement; Data mining; Flowcharts; Inspection; Job shop scheduling; Manufacturing processes; Parametric statistics; Predictive models; Semiconductor device modeling; Yield estimation;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop, 1997. IEEE/SEMI
Conference_Location
Cambridge, MA
ISSN
1078-8743
Print_ISBN
0-7803-4050-7
Type
conf
DOI
10.1109/ASMC.1997.630711
Filename
630711
Link To Document