High power CW RF probe measurements

A novel technique for accurately and efficiently acquiring high-power, CW (continuous wave) RF probe measurements while overcoming the challenges from bias-driven oscillations and thermal gradients has been developed. The ability to make on-wafer CW high-power measurements addresses the measurement of nonpulsed application devices and also permits traditional RLC transient suppressive circuitry to be implemented as part of the test system, thus averting the high-voltage challenges associated with DC pulsing a RLC configuration. The technique is demonstrated through a series of repeatability tests and correlation with fixtured data.<>