Title :
All inorganic spin-coated nanoparticle memory device
Author :
Mondal, Sandip ; Venkataraman, V.
Author_Institution :
Dept. of Phys., Indian Inst. of Sci., Bengaluru, India
Abstract :
Summary form only given. Two terminal floating gate capacitive memory structures with novel materials and fabrication strategies continue to attract tremendous interest since they form the backbone of conventional nonvolatile flash memory technology. Some of these approaches that involve high temperature deposition or ultra-high vacuum systems are not suitable for low-cost large area electronics. Spin-coated polymer memory devices with low temperature processing have been demonstrated as an alternative. However, most of them are resistively switched memories which are incompatible with standard flash technology. Moreover, polymer devices are environmentally unstable and quickly degrade at elevated temperatures and ambient air operating conditions. Here we demonstrate a two-terminal all inorganic spin coated capacitive memory device using Aluminum Oxide Phosphate (ALPO) as the dielectric and Cadmium Telluride Nanoparticles (CdTe-NP) for charge storage. These structures can be used to realize transistors whose threshold voltage can be switched depending on the charge stored in the nanoparticles. In two-terminal capacitive devices, an experimental challenge is to measure the threshold voltage (or equivalently the flatband voltage VFB) without disturbing the memory state. Conventional LCR meters with slow DC sweeps generate CV curves (LCRCV) with hysteresis, showing that the charge storage, and hence memory state, is altered during the measurement itself. In order to decouple the memory programming (“writing”) with the flatband voltage measurement (“reading”), we have realized a simple high speed CV (HSCV) pulse circuit that completes the measurement in less than 10 μs, faster than the time required to change the charge state.
Keywords :
II-VI semiconductors; cadmium compounds; nanoelectronics; nanoparticles; semiconductor storage; spin coating; ALPO; CdTe; aluminum oxide phosphate; charge storage; flatband voltage measurement; high temperature deposition; inorganic memory device; inorganic spin coated capacitive memory device; low cost large area electronics; memory programming; spin coated nanoparticle memory device; two terminal floating gate capacitive memory structures; ultrahigh vacuum system; Aluminum; Current measurement; Hysteresis; Programming; Silicon; Writing;
Conference_Titel :
Device Research Conference (DRC), 2015 73rd Annual
Conference_Location :
Columbus, OH
Print_ISBN :
978-1-4673-8134-5
DOI :
10.1109/DRC.2015.7175589