• DocumentCode
    3388866
  • Title

    Cu-insulator-Si hybrid plasmonic waveguide based CMOS-compatible Nanophotonic Devices

  • Author

    Shiyang Zhu ; Lo, G.Q. ; Kwong, D.L.

  • Author_Institution
    Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
  • fYear
    2013
  • fDate
    2-4 Jan. 2013
  • Firstpage
    33
  • Lastpage
    36
  • Abstract
    Vertical Cu-insulator-Si hybrid plasmonic waveguides (HPWs) along with various passive components are fabricated on a silicon-on-insulator platform using standard complementary metal-oxide-semiconductor (CMOS), technology and characterized at 1550-nm telecom wavelengths. The HPW exhibits relatively low propagation loss of -0.12 dB/μm and high coupling efficiency of -86% with the conventional Si strip waveguide. A plasmonic waveguide-ring resonator with 1.09-μm radius exhibits extinction ratio of -13.7 dB, free spectral range of -106 nm, and Q-factor of -63. By applying a voltage between the metal cap and the Si core, the propagation property of HPW can be modulated to realize ultra-compact EO modulators.
  • Keywords
    CMOS integrated circuits; MIM devices; copper; nanophotonics; plasmonics; silicon; waveguides; CMOS technology; CMOS-compatible nanophotonic devices; Cu; Si; complementary metal-oxide-semiconductor; plasmonic waveguide-ring resonator; silicon-on-insulator platform; size 1.09 mum; vertical Cu-insulator-Si hybrid plasmonic waveguide; wavelength 1550 nm; Couplers; Couplings; Metals; Optical waveguides; Plasmons; Propagation losses; Silicon; Nanophotonics; Nanoplasmonics; Silicon photonic integrated circuits;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2013 IEEE 5th International
  • Conference_Location
    Singapore
  • ISSN
    2159-3523
  • Print_ISBN
    978-1-4673-4840-9
  • Electronic_ISBN
    2159-3523
  • Type

    conf

  • DOI
    10.1109/INEC.2013.6465945
  • Filename
    6465945