DocumentCode :
3388866
Title :
Cu-insulator-Si hybrid plasmonic waveguide based CMOS-compatible Nanophotonic Devices
Author :
Shiyang Zhu ; Lo, G.Q. ; Kwong, D.L.
Author_Institution :
Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
fYear :
2013
fDate :
2-4 Jan. 2013
Firstpage :
33
Lastpage :
36
Abstract :
Vertical Cu-insulator-Si hybrid plasmonic waveguides (HPWs) along with various passive components are fabricated on a silicon-on-insulator platform using standard complementary metal-oxide-semiconductor (CMOS), technology and characterized at 1550-nm telecom wavelengths. The HPW exhibits relatively low propagation loss of -0.12 dB/μm and high coupling efficiency of -86% with the conventional Si strip waveguide. A plasmonic waveguide-ring resonator with 1.09-μm radius exhibits extinction ratio of -13.7 dB, free spectral range of -106 nm, and Q-factor of -63. By applying a voltage between the metal cap and the Si core, the propagation property of HPW can be modulated to realize ultra-compact EO modulators.
Keywords :
CMOS integrated circuits; MIM devices; copper; nanophotonics; plasmonics; silicon; waveguides; CMOS technology; CMOS-compatible nanophotonic devices; Cu; Si; complementary metal-oxide-semiconductor; plasmonic waveguide-ring resonator; silicon-on-insulator platform; size 1.09 mum; vertical Cu-insulator-Si hybrid plasmonic waveguide; wavelength 1550 nm; Couplers; Couplings; Metals; Optical waveguides; Plasmons; Propagation losses; Silicon; Nanophotonics; Nanoplasmonics; Silicon photonic integrated circuits;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference (INEC), 2013 IEEE 5th International
Conference_Location :
Singapore
ISSN :
2159-3523
Print_ISBN :
978-1-4673-4840-9
Electronic_ISBN :
2159-3523
Type :
conf
DOI :
10.1109/INEC.2013.6465945
Filename :
6465945
Link To Document :
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