• DocumentCode
    3389205
  • Title

    Radio frequency transistors and circuit applications based on CVD MoS2

  • Author

    Sanne, A. ; Yogeesh, M. Nagavalli ; Ghosh, R. ; Rai, A. ; Shin, S.H. ; Sharma, A. ; Mathew, L. ; Rao, R. ; Akinwande, D. ; Banerjee, S.

  • Author_Institution
    Microelectron. Res. Center, Univ. of Texas at Austin, Austin, TX, USA
  • fYear
    2015
  • fDate
    21-24 June 2015
  • Firstpage
    215
  • Lastpage
    216
  • Abstract
    Summary form only given. Molybdenum disulfide (MoS2), a member of the transition metal dichalcogenide (TMD) family, is a 2D semiconductor with a direct bandgap of ~1.8 eV for single layers. Its bandgap allows for high Ion/Ioff metal-oxide semiconducting field-effect transistors (FETs). Exfoliated monolayer MoS2 FETs exhibit current saturation with on-state current densities of 300 μA/μm, as well as transconductances exceeding 40 μS/μm [1]. These properties make MoS2 a desirable candidate for radio frequency (RF) applications [1, 2, 3]. However, in order for MoS2 devices to move from laboratory experimentations to industrial scale applications, large area synthesis of high quality material is needed. Here we demonstrate gigahertz RF performance and circuits (amplifier and mixer) using chemical vapor deposited (CVD) monolayer MoS2 FETs.
  • Keywords
    MOSFET; chemical vapour deposition; current density; microwave transistors; mixers (circuits); molybdenum compounds; monolayers; radiofrequency amplifiers; 2D semiconductor; CVD; MOSFET; MoS2; TMD family; amplifier; chemical vapor deposition; current saturation; direct bandgap; gigahertz RF performance; metal-oxide semiconducting field-effect transistors; mixer; molybdenum disulfide; monolayer FET; on-state current densities; radio frequency transistor; transconductances; transition metal dichalcogenide; Atomic layer deposition; Dielectric measurement; Dielectrics; Logic gates; Mixers; Receivers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2015 73rd Annual
  • Conference_Location
    Columbus, OH
  • Print_ISBN
    978-1-4673-8134-5
  • Type

    conf

  • DOI
    10.1109/DRC.2015.7175642
  • Filename
    7175642