• DocumentCode
    3390534
  • Title

    Simulation study of dimensional effect on bipolar resistive random access memory (RRAM)

  • Author

    Liu Kai ; Zhang Kailiang ; Wang Fang ; Zhao Jinshi ; Wei Jun

  • Author_Institution
    Tianjin Key Lab. of Film Electron. & Commun. Devices, Tianjin Univ. of Technol., Tianjin, China
  • fYear
    2013
  • fDate
    2-4 Jan. 2013
  • Firstpage
    306
  • Lastpage
    308
  • Abstract
    The dependency of the RRAM device electrical parameters such as set voltage, reset current and resistance on the RRAM cell dimensional scalability is investigated with Monte Carlo simulation to optimize the power consumption of bipolar RRAM. It is found in the simulation that the switching process in bipolar RRAM is related to the cell dimension in the sub-nm region in terms of its horizontal length. The suppressing effect of existing conducting filament is also discussed. With optimal cell size sufficient initial resistance and a low forming voltage will be achieved, accelerating the feasibility of the high-density low-power RRAM.
  • Keywords
    Monte Carlo methods; low-power electronics; random-access storage; Monte Carlo simulation; RRAM device electrical parameters; bipolar resistive random access memory; cell dimension; cell dimensional scalability; conducting filament; high-density low-power RRAM; horizontal length; low forming voltage; optimal cell size sufficient initial resistance; power consumption optimization; reset current; set voltage; sub-nm region; switching process; Conferences; Decision support systems; Erbium; Nanoelectronics; Resistance; RRAM; electric parameter and computational simulation; power consumption;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2013 IEEE 5th International
  • Conference_Location
    Singapore
  • ISSN
    2159-3523
  • Print_ISBN
    978-1-4673-4840-9
  • Electronic_ISBN
    2159-3523
  • Type

    conf

  • DOI
    10.1109/INEC.2013.6466031
  • Filename
    6466031