• DocumentCode
    3390620
  • Title

    Introduction of infrared spectroscopic ellipsometry in a semiconductor production environment

  • Author

    Weidner, P. ; Mantz, U. ; Guittet, P.-Y. ; Wienhold, R. ; Rimane, M. ; Stehlé, Jean-Louis ; Boher, Pierre ; Bucchia, Marc

  • Author_Institution
    Infineon Technol. Dresden GmbH, Germany
  • fYear
    2003
  • fDate
    31 March-1 April 2003
  • Firstpage
    244
  • Lastpage
    249
  • Abstract
    IRSE proposes a complementary type of characterization to widely accepted UV-VIS ellipsometry. IRSE is sensitive to absorption bands (vibrational and rotational states of molecules) and free carriers. IRSE reduces also sensitivity to scattering due to roughness or very small CDs. We present here an IRSE production tool integrated in clean-room class 1: the SOPRA IRSE200. Our first objective is to assess IRSE capabilities for better sensitivity, stability and throughput for thin epilayers (20 nm-120 nm) thickness monitoring. A production strategy is developed on this topic.
  • Keywords
    clean rooms; ellipsometry; process monitoring; semiconductor epitaxial layers; thickness measurement; 20 to 120 nm; SOPRA IRSE200; clean room; epilayer thickness monitoring; infrared spectroscopic ellipsometry; semiconductor production environment; Data analysis; Ellipsometry; Infrared spectra; Monitoring; Optical materials; Optical polarization; Optical scattering; Optical surface waves; Production; Spectroscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI
  • ISSN
    1078-8743
  • Print_ISBN
    0-7803-7681-1
  • Type

    conf

  • DOI
    10.1109/ASMC.2003.1194501
  • Filename
    1194501