DocumentCode
3390620
Title
Introduction of infrared spectroscopic ellipsometry in a semiconductor production environment
Author
Weidner, P. ; Mantz, U. ; Guittet, P.-Y. ; Wienhold, R. ; Rimane, M. ; Stehlé, Jean-Louis ; Boher, Pierre ; Bucchia, Marc
Author_Institution
Infineon Technol. Dresden GmbH, Germany
fYear
2003
fDate
31 March-1 April 2003
Firstpage
244
Lastpage
249
Abstract
IRSE proposes a complementary type of characterization to widely accepted UV-VIS ellipsometry. IRSE is sensitive to absorption bands (vibrational and rotational states of molecules) and free carriers. IRSE reduces also sensitivity to scattering due to roughness or very small CDs. We present here an IRSE production tool integrated in clean-room class 1: the SOPRA IRSE200. Our first objective is to assess IRSE capabilities for better sensitivity, stability and throughput for thin epilayers (20 nm-120 nm) thickness monitoring. A production strategy is developed on this topic.
Keywords
clean rooms; ellipsometry; process monitoring; semiconductor epitaxial layers; thickness measurement; 20 to 120 nm; SOPRA IRSE200; clean room; epilayer thickness monitoring; infrared spectroscopic ellipsometry; semiconductor production environment; Data analysis; Ellipsometry; Infrared spectra; Monitoring; Optical materials; Optical polarization; Optical scattering; Optical surface waves; Production; Spectroscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI
ISSN
1078-8743
Print_ISBN
0-7803-7681-1
Type
conf
DOI
10.1109/ASMC.2003.1194501
Filename
1194501
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