DocumentCode :
3393605
Title :
Application of a bitmap analysis system to the forefront of DRAM devices development
Author :
Hamada, Takehiko ; Sugimoto, Masaaki
Author_Institution :
Evaluation Technol. Dept., NEC Corp., Kawasaki, Japan
fYear :
1997
fDate :
10-12 Sep 1997
Firstpage :
222
Lastpage :
227
Abstract :
A bitmap analysis system with a shape classification has been developed for use in manufacturing of forefront DRAM devices. This system shortens the time needed to improve the processing conditions according to the results of failure analysis. This system is a part of a total yield enhancement system have already been put to practical use in mass production
Keywords :
DRAM chips; failure analysis; integrated circuit yield; DRAM device manufacture; bitmap analysis; failure analysis; mass production; shape classification; yield enhancement; Circuits; Failure analysis; Feedback; Inspection; Laboratories; Manufacturing; Mass production; National electric code; Random access memory; Shape;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1997. IEEE/SEMI
Conference_Location :
Cambridge, MA
ISSN :
1078-8743
Print_ISBN :
0-7803-4050-7
Type :
conf
DOI :
10.1109/ASMC.1997.630739
Filename :
630739
Link To Document :
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