Title :
PLD elaboration of piezoelectric ZnO thin film for 540 MHz Al/ZnO/Pt bulk acoustic wave resonator
Author :
Serhane, Rafik ; Khales, Hammouche ; Aouimeur, Walid ; Hassein Bey, Abdelkader ; Abdelli-Messaci, Samira ; Lafane, Slimane ; Boutkedjirt, Tarek
Author_Institution :
Div. Microelectron. et Nanotechnol., Centre de Dev. des Technol. Av. (CDTA), Algiers, Algeria
Abstract :
The ZnO thin films in Al/ZnO/Pt/Ti/SiO2/Si Bulk Acoustic Wave (BAW) resonators are realized by a reactive Pulsed Laser Deposition (PLD) technique. It is of most interest to improve their piezoelectric characteristics. These later are intimately linked to the microstructure, the texture and the growth conditions. In this work, the piezoelectric characteristics of ZnO thin films have been investigated. Wurtzite ZnO thin films were prepared on Pt(111) at different substrate temperatures (100-500 °C). The 200 nm of Pt on 20 nm Ti were prepared by Electron Beam Deposition (EBD) technique at room temperature on 2 μm SiO2 substrate. This SiO2 film has been realized by Silicon wet thermal oxidation step at 1100 °C. The top electrode of the BAW was made by thermal evaporation of Aluminum; the piezoelectric film was confined in a circle of 1.8 mm radius. X-Ray Diffraction (XRD) characterization showed that the deposited Pt (bottom electrode) has (111) preferential orientation. It also showed that the ZnO films were c-axis (002) oriented. The Scanning Electron Microscopy (SEM) of the realized ZnO thin films showed evidence of compact grains with honeycomb-like structure on surface and evidence of columnar structure on cross-section. The measurements indicate that all substrate temperatures are suitable to obtain a good quality of ZnO, but Ts=300 °C is the optimum. In order to evaluate the piezoelectric properties of the BAW, measurements of the electrical input impedance and admittance have been performed. They showed evidence of piezoelectric response. The resonance frequency was obtained at 524.5 MHz and the anti-resonance frequency at 540.9 MHz. The electromechanical coupling coefficient Keff2 was evaluated to be 7.26 %, which is an indicator of a good piezoelectric response. From this measured values, the thickness d and the wave velocity Vp in the ZnO slab were de- uced to be respectively 6.15 μm and 6451.35 m/s and the piezoelectric constant e33 was found to be equal to 1.21 C/m2.
Keywords :
II-VI semiconductors; X-ray diffraction; acoustic resonators; aluminium; bulk acoustic wave devices; crystal resonators; electron beam deposition; elemental semiconductors; piezoelectric semiconductors; platinum; pulsed laser deposition; scanning electron microscopy; semiconductor thin films; silicon; silicon compounds; thin film devices; vacuum deposition; wide band gap semiconductors; zinc compounds; Al-ZnO-Pt; BAW resonator; EBD; PLD elaboration; SEM; Si; SiO2; X-ray diffraction; XRD characterization; acoustic wave resonator; admittance; bottom electrode; columnar structure; electrical input impedance; electromechanical coupling coefficient; electron beam deposition technique; frequency 540 MHz; frequency 540.9 MHz; growth conditions; honeycomb-like structure; microstructure; piezoelectric thin film; preferential orientation; radius 1.8 mm; reactive pulsed laser deposition technique; scanning electron microscopy; silicon wet thermal oxidation; size 2 mum; size 20 nm; size 200 nm; size 6.15 mum; slab; temperature 100 degC to 500 degC; temperature 1100 degC; temperature 293 K to 298 K; thermal evaporation; top electrode; velocity 6451.35 m/s; wurtzite thin films; Films; Silicon; Substrates; Surface impedance; Surface morphology; Surface treatment; Zinc oxide; Bulk acoustic wave; Piezoelectricity; Pulsed laser deposition; Thin films; ZnO;
Conference_Titel :
Applications of Ferroelectric and Workshop on the Piezoresponse Force Microscopy (ISAF/PFM), 2013 IEEE International Symposium on the
Conference_Location :
Prague
DOI :
10.1109/ISAF.2013.6748667