Title :
The role of self-directed work teams in a concurrent, multi-generation semiconductor process development effort
Author :
Weber, Charles ; Rosner, Jeff ; Chang, Patrick
Author_Institution :
Integrated Circuit Technol. Dev. Center, Hewlett-Packard Co., Palo Alto, CA, USA
Abstract :
An integrated circuit process R&D facility concurrently conducts advanced research, process control and product prototyping of three Very Large Scale Integrated Circuit process generations. Self-managed inter-departmental teams of process engineers and device physicists govern most aspects of process integration through a peer review process, and collectively design short cycle experiments. Organizational structures are adjusted to minimize the number of communication channels. Key metrics traditionally associated with process integration improve by a factor of three
Keywords :
VLSI; integrated circuit technology; process control; research and development management; IC process R&D facility; VLSI fabrication; advanced research; organizational structure adjustment; peer review process; process control; process integration; product prototyping; self-directed work teams; self-managed inter-departmental teams; semiconductor process development; short cycle experiments design; Collaboration; Collaborative work; Design engineering; Educational institutions; Engineering management; Integrated circuit technology; Process control; Reliability engineering; Research and development; Scattering;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1997. IEEE/SEMI
Conference_Location :
Cambridge, MA
Print_ISBN :
0-7803-4050-7
DOI :
10.1109/ASMC.1997.630756