DocumentCode
3397530
Title
Staffing analysis tool for operator-machine-lot interference in semiconductor manufacturing
Author
Meyersdorf, Doron ; Biron, Ori ; Ozelkan, Ertunga C. ; Fowler, John W.
Author_Institution
Ind. Eng. & Syst. Anal. Ltd., Foster City, CA, USA
fYear
1997
fDate
10-12 Sep 1997
Firstpage
335
Lastpage
340
Abstract
This paper describes the concepts underlying a new staffing tool, which evaluates staffing requirements, plan future shift sizes, perform sensitivity analysis, and locate and measure improvement opportunities in terms of worker operations. The model is based on M/M/S/K queuing theory to analyze the operator-machine-lot (OML) interference especially in semiconductor manufacturing processes. Unlike classical approaches, in which the machines are treated as customers, here wafer lots are taken as the designated customers to be serviced. A comparison of a simulation, OML, and a traditional M/M/S/K model (where the machines are modeled as customers) shows that OML model yields much closer results to the simulation than the traditional M/M/S/K model. Furthermore, from the computational point of view OML is more efficient than the simulation model which can be very time consuming especially in the complex semiconductor manufacturing environment. Thus, OML model is a superior alternative to the classical interference modeling and facilitates staffing recommendations that improve overall equipment effectiveness (GEE) and therefore productivity
Keywords
computer aided production planning; human resource management; integrated circuit manufacture; personnel; queueing theory; semiconductor device manufacture; sensitivity analysis; M/M/S/K queuing theory; operator-machine-lot interference; productivity; semiconductor manufacturing; sensitivity analysis; shift size planning; staffing analysis tool; staffing requirements evaluation; wafer lot; worker operations; Computational modeling; Computer aided manufacturing; Interference; Manufacturing processes; Performance evaluation; Queueing analysis; Semiconductor device modeling; Sensitivity analysis; Size measurement; Virtual manufacturing;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop, 1997. IEEE/SEMI
Conference_Location
Cambridge, MA
ISSN
1078-8743
Print_ISBN
0-7803-4050-7
Type
conf
DOI
10.1109/ASMC.1997.630758
Filename
630758
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