DocumentCode :
3397962
Title :
Frequency dispersion in GaAs metal-semiconductor field-effect transistor transconductance
Author :
Prokhorov, E.F. ; Gorev, N.B. ; Kodzhespirova, I.F. ; Privalov, E.N.
Author_Institution :
Centro de Investig. en Materialos Av., Chihuahua
fYear :
2008
fDate :
8-12 Sept. 2008
Firstpage :
143
Lastpage :
144
Abstract :
A quasi-2D numerical model a GaAs metal-semiconductor field-effect transistor, which drops the conventional sharp-boundary approximation, is presented. Using this model, both the low- and the high-frequency transistor transconductance is calculated. It is shown that the transconductance shows marked frequency dispersion in the drain current saturation region, which may have a significant impact on the small-signal voltage gain of a transistor amplifier.
Keywords :
III-V semiconductors; Schottky gate field effect transistors; amplifiers; gallium arsenide; GaAs; conventional sharp-boundary approximation; drain current saturation; frequency dispersion; high-frequency transistor transconductance; low-frequency transistor transconductance; metal-semiconductor field-effect transistor transconductance; quasi-2D numerical model; small-signal voltage gain; transistor amplifier; Electronic mail; FETs; Frequency; Gallium arsenide; Intrusion detection; MESFETs; Metals industry; Substrates; Threshold voltage; Transconductance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave & Telecommunication Technology, 2008. CriMiCo 2008. 2008 18th International Crimean Conference
Conference_Location :
Sevastopol, Crimea
Print_ISBN :
978-966-335-166-7
Electronic_ISBN :
978-966-335-169-8
Type :
conf
DOI :
10.1109/CRMICO.2008.4676324
Filename :
4676324
Link To Document :
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