Title :
Field averaging micro-lenses that synthesize highly uniform illumination in coherent EUV optical systems
Author :
Anderson, Christopher N. ; Naulleau, Patrick P.
Author_Institution :
UC Berkeley, Berkeley
fDate :
July 29 2007-Aug. 11 2007
Abstract :
Illumination uniformity in exposure tools is critical to several aspects of the extreme ultraviolet lithography development task. We´ve developed a field-averaging scanning-micro-lens system synthesizing robust, uniform illumination from non-uniform, high-coherence extreme ultraviolet sources enabling these sources to be used in applications requiring a high degree of illumination uniformity.
Keywords :
light coherence; microlenses; ultraviolet sources; coherent optical systems; extreme ultraviolet lithography; extreme ultraviolet optical systems; extreme ultraviolet sources; field averaging; field-averaging system; illumination uniformity; microlenses; scanning-microlens system; Coherence; Lighting; Lithography; Mirrors; Performance analysis; Printing; Robustness; Synchrotron radiation; Throughput; Ultraviolet sources;
Conference_Titel :
Nano-Optoelectronics Workshop, 2007. i-NOW '07. International
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-1591-5
DOI :
10.1109/INOW.2007.4302952
