DocumentCode
3399723
Title
Representation and Inhibition of Abnormal Arcing in Plasma Vapor Deposition Filming
Author
Linggang Kong ; Qing´an Jiang ; Weizhong Zhang
Author_Institution
Lanzhou Jiaotong Univ., Lanzhou
fYear
2007
fDate
July 29 2007-Aug. 11 2007
Firstpage
262
Lastpage
263
Abstract
This paper introduces representations of abnormal arcing based on equivalent impedance derived function and further proposes an inhibition design grounded on impedance change rate diagnosis in filming process of plasma vapor deposition.
Keywords
arcs (electric); electric impedance; plasma deposition; vapour deposition; equivalent impedance derived function; filming process; impedance change rate diagnosis; inhibition design; plasma vapor deposition; Chemical vapor deposition; Impedance; Plasma density; Plasma diagnostics; Plasma displays; Plasma materials processing; Plasma properties; Plasma sheaths; Plasma temperature; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano-Optoelectronics Workshop, 2007. i-NOW '07. International
Conference_Location
Beijing
Print_ISBN
978-1-4244-1591-5
Type
conf
DOI
10.1109/INOW.2007.4302982
Filename
4302982
Link To Document