DocumentCode
3399822
Title
Study of Carbon Nano-Tube Photo-electronic Devices by Nano-Imprint Lithography
Author
Liu, Hongzhong ; Ding, Yucheng ; Yin, Lei ; Lu, Bingheng ; Fan, Duowang
Author_Institution
Xi´´an Jiaotong Univ., Xian
fYear
2007
fDate
July 29 2007-Aug. 11 2007
Firstpage
274
Lastpage
275
Abstract
Nano-imprint lithography (NIL) technology is presented to fabricate carbon nano-tube (CNT) arrays for field emission (FE) and sensor devices by process control and optimization. Results reveal that the CNT arrays are high resolution and fidelity.
Keywords
carbon nanotubes; materials preparation; nanolithography; nanotube devices; C; carbon nano-tube photo-electronic devices; field emission device; nano-imprint lithography; sensors; Chromium; Curing; Etching; Insulation; Intelligent sensors; Lithography; Nanoscale devices; Resists; Sensor arrays; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano-Optoelectronics Workshop, 2007. i-NOW '07. International
Conference_Location
Beijing
Print_ISBN
978-1-4244-1591-5
Type
conf
DOI
10.1109/INOW.2007.4302988
Filename
4302988
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