Title :
Study of Carbon Nano-Tube Photo-electronic Devices by Nano-Imprint Lithography
Author :
Liu, Hongzhong ; Ding, Yucheng ; Yin, Lei ; Lu, Bingheng ; Fan, Duowang
Author_Institution :
Xi´´an Jiaotong Univ., Xian
fDate :
July 29 2007-Aug. 11 2007
Abstract :
Nano-imprint lithography (NIL) technology is presented to fabricate carbon nano-tube (CNT) arrays for field emission (FE) and sensor devices by process control and optimization. Results reveal that the CNT arrays are high resolution and fidelity.
Keywords :
carbon nanotubes; materials preparation; nanolithography; nanotube devices; C; carbon nano-tube photo-electronic devices; field emission device; nano-imprint lithography; sensors; Chromium; Curing; Etching; Insulation; Intelligent sensors; Lithography; Nanoscale devices; Resists; Sensor arrays; Substrates;
Conference_Titel :
Nano-Optoelectronics Workshop, 2007. i-NOW '07. International
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-1591-5
DOI :
10.1109/INOW.2007.4302988
