• DocumentCode
    3399966
  • Title

    Approach for producing TiO2 thin films in large scale

  • Author

    Wang, Y. ; Zhang, Y.Y. ; Chen, Y.

  • Author_Institution
    Lanzhou Jiaotong Univ., Lanzhou
  • fYear
    2007
  • fDate
    July 29 2007-Aug. 11 2007
  • Firstpage
    290
  • Lastpage
    291
  • Abstract
    TiO2 thin film was prepared using vacuum metallising system (VMS). The technology is developed for the mass production to deposit TiO2 thin film on the substrate of metal or nonmetal materials.
  • Keywords
    thin films; titanium compounds; vacuum deposited coatings; vacuum deposition; TiO2; automotive lighting vacuum metallising system; titanium dioxide thin films; vacuum evaporation deposition; vacuum metallising system; Glass; Inorganic materials; Iron; Large-scale systems; Mass production; Sputtering; Substrates; Transistors; Vacuum systems; Vacuum technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano-Optoelectronics Workshop, 2007. i-NOW '07. International
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-1591-5
  • Type

    conf

  • DOI
    10.1109/INOW.2007.4302996
  • Filename
    4302996
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3399966