DocumentCode :
3399966
Title :
Approach for producing TiO2 thin films in large scale
Author :
Wang, Y. ; Zhang, Y.Y. ; Chen, Y.
Author_Institution :
Lanzhou Jiaotong Univ., Lanzhou
fYear :
2007
fDate :
July 29 2007-Aug. 11 2007
Firstpage :
290
Lastpage :
291
Abstract :
TiO2 thin film was prepared using vacuum metallising system (VMS). The technology is developed for the mass production to deposit TiO2 thin film on the substrate of metal or nonmetal materials.
Keywords :
thin films; titanium compounds; vacuum deposited coatings; vacuum deposition; TiO2; automotive lighting vacuum metallising system; titanium dioxide thin films; vacuum evaporation deposition; vacuum metallising system; Glass; Inorganic materials; Iron; Large-scale systems; Mass production; Sputtering; Substrates; Transistors; Vacuum systems; Vacuum technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano-Optoelectronics Workshop, 2007. i-NOW '07. International
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-1591-5
Type :
conf
DOI :
10.1109/INOW.2007.4302996
Filename :
4302996
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3399966
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