DocumentCode :
3401192
Title :
Properties and technology of sputtering of yttrium iron garnet films for spin-wave electronics
Author :
Nikolaychuk, G.A. ; Yakovlev, S.V. ; Lutsev, L.V. ; Andreev, A.N. ; Filimonov, V.V.
Author_Institution :
Res. Inst. "Ferrite-Domen", St. Petersburg
fYear :
2008
fDate :
8-12 Sept. 2008
Firstpage :
552
Lastpage :
553
Abstract :
Deposition of yttrium iron garnet films produced by magnetron sputtering are considered. The main consideration is paid to technology methods to obtain stoichiometric composition of sputtered films.
Keywords :
ferromagnetic materials; magnetic thin films; sputter deposition; yttrium compounds; Y3Fe5O12; magnetron sputtering; spin-wave electronics; stoichiometric composition; Garnet films; Iron; Magnetic analysis; Magnetic films; Performance analysis; Solids; Sputter etching; Sputtering; Surface contamination; Yttrium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave & Telecommunication Technology, 2008. CriMiCo 2008. 2008 18th International Crimean Conference
Conference_Location :
Sevastopol, Crimea
Print_ISBN :
978-966-335-166-7
Electronic_ISBN :
978-966-335-169-8
Type :
conf
DOI :
10.1109/CRMICO.2008.4676499
Filename :
4676499
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3401192
بازگشت