System Requirement Analysis of Laser Interference Nanolithography

Author

Wang, Zuobin ; Zhang, Jin ; Peng, Changsi ; Tan, Chunlei ; Ayerdi, Isabel ; Rodriguez, Ainara ; Verevkin, Yury K. ; Berthou, Thierry ; Tisserand, Stéphane ; Olaizola, Santiago M.

Author_Institution

Cardiff Univ., Cardiff

fYear

2007

fDate

5-8 Aug. 2007

Firstpage

434

Lastpage

439

Abstract

This paper presents a system requirement analysis of multi-beam laser interference nanolithography for nanoscale structuring of materials including seven sections: introduction, formation of multi-beam laser interference patterns, user requirements, system architecture, experiments, discussions and conclusions. Analytical expressions were obtained for the spatial distribution of radiation of the interfering beams as a function of their amplitudes, phases, angles of incidence on the sample, and polarization planes with computer simulation and experimental results. The environmental effect and technological potential were also discussed.

Keywords

light interferometry; nanolithography; nanopatterning; photolithography; amplitudes; interferometry; laser interference nano lithography; nano patterning; nanoscale structuring; polarization planes; spatial distribution; system requirement analysis; Etching; Interference; Ion beams; Laser beams; Lithography; Nanolithography; Optical materials; Probes; Resists; Writing; interferometry; laser interference nanolithography; nano patterning; nano structuring;

fLanguage

English

Publisher

ieee

Conference_Titel

Mechatronics and Automation, 2007. ICMA 2007. International Conference on

Conference_Location

Harbin

Print_ISBN

978-1-4244-0828-3

Electronic_ISBN

978-1-4244-0828-3

Type

conf

DOI

10.1109/ICMA.2007.4303582

Filename

4303582