Title :
Observations and analysis of extreme ultraviolet emission between 10nm and 70nm by capillary discharge with Xe as target
Author :
Yong-peng, Zhao ; Qiang, Xu ; Yang, Liu ; Gang, Wen ; Qi, Wang ; Qi, Li ; Wen-yuan, Deng
Author_Institution :
Nat. Key Lab. of Sci. & Technol. on Tunable Laser, Harbin Inst. of Technol., Harbin, China
Abstract :
Spectra have been recorded from a Xe discharge capillary discharge source in the extreme ultraviolet (EUV) region between 10nm and 70nm. The origin of the spectra have been analyzed, which have shown that the spectra between 10nm and 20nm come from the transitions of 4p-4d, 4d-4f and 4d-5p by Xe7+~Xe12+, and the spectra between 20nm~70nm mainly from the transitions of Xe6+~Xe8+ as well. The results which have been integrated the experimental results with the theory have shown that the spectra from Xe6+~Xe8+ formed in the time after the collapsed of the compressing of the plasma.
Keywords :
capillarity; discharges (electric); optical variables measurement; plasma diagnostics; ultraviolet lithography; xenon; Xe; Xe discharge; capillary discharge; extreme ultraviolet emission; plasma compression; wavelength 10 nm to 70 nm; Discharges; Fault location; Ions; Plasmas; Ultraviolet sources; Xenon; 13.5nm Emission; Capillary Discharge; EUV source; Extreme ultravilet lithograph; Xe discharge;
Conference_Titel :
Optoelectronics and Microelectronics Technology (AISOMT), 2011 Academic International Symposium on
Conference_Location :
Harbin
Print_ISBN :
978-1-4577-0794-0
DOI :
10.1109/AISMOT.2011.6159343