Title :
Characteristics of Er3+:Al2O3 thin-films deposited by reactive co-sputtering for application in optical amplification
Author :
Musa, S. ; van Weerden, H.J. ; Yau, T.H. ; Lambeck, P.V.
Author_Institution :
MESA Res. Inst., Twente Univ., Enschede, Netherlands
Abstract :
Er3+-doped Al2O3 films have been deposited by reactive co-sputtering onto thermally oxidized Si-wafers for use in optical amplification. Low background losses and broad emission band were measured. High concentration and gain can be achieved
Keywords :
alumina; erbium; impurity absorption spectra; integrated optics; optical fabrication; optical films; optical losses; photoluminescence; solid lasers; sputtered coatings; waveguide lasers; Al2O3:Er; Er3+:Al2O3 thin-films; Low background losses; Si; absorption spectrum; broad emission band; gain; high concentration; integrated optical amplifiers; optical amplification; photoluminescence emission spectrum; reactive co-sputtering; thermally oxidized Si-wafers; Absorption; Annealing; Artificial intelligence; Erbium; Luminescence; Optical amplifiers; Optical films; Optical waveguides; Power amplifiers; Thin films;
Conference_Titel :
LEOS '99. IEEE Lasers and Electro-Optics Society 1999 12th Annual Meeting
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-5634-9
DOI :
10.1109/LEOS.1999.811985
