Title :
A novel beam line for sub-keV implants with reduced energy contamination
Author :
Angel, Gordon ; Bell, Edward ; Brown, Douglas ; Buff, James ; Cummings, James ; Edwards, William ; McKenna, Charles ; Radovanov, Svetlana ; White, Nicholas R.
Author_Institution :
Varian Ion Implant Syst., Gloucester, MA, USA
Abstract :
A high current ion implantation system is described that addresses the needs of the implant community for high beam currents at both high and low energies. The system uses a unique two-magnet design to produce an effectively shortened beam line for production of ions at low energies. The design philosophy, configuration of the machine and some process results are presented
Keywords :
beam handling equipment; ion implantation; particle beam diagnostics; semiconductor device manufacture; semiconductor doping; beam line; configuration; design philosophy; effectively shortened beam line; implant community; reduced energy contamination; sub-keV implants; two-magnet design; Contamination; Costs; Energy resolution; Implants; Ion implantation; Ion sources; Magnetic analysis; Manufacturing; Production systems; Silicon;
Conference_Titel :
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-4538-X
DOI :
10.1109/IIT.1999.812084
