DocumentCode
3408786
Title
A novel beam line for sub-keV implants with reduced energy contamination
Author
Angel, Gordon ; Bell, Edward ; Brown, Douglas ; Buff, James ; Cummings, James ; Edwards, William ; McKenna, Charles ; Radovanov, Svetlana ; White, Nicholas R.
Author_Institution
Varian Ion Implant Syst., Gloucester, MA, USA
Volume
1
fYear
1999
fDate
1999
Firstpage
188
Abstract
A high current ion implantation system is described that addresses the needs of the implant community for high beam currents at both high and low energies. The system uses a unique two-magnet design to produce an effectively shortened beam line for production of ions at low energies. The design philosophy, configuration of the machine and some process results are presented
Keywords
beam handling equipment; ion implantation; particle beam diagnostics; semiconductor device manufacture; semiconductor doping; beam line; configuration; design philosophy; effectively shortened beam line; implant community; reduced energy contamination; sub-keV implants; two-magnet design; Contamination; Costs; Energy resolution; Implants; Ion implantation; Ion sources; Magnetic analysis; Manufacturing; Production systems; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location
Kyoto
Print_ISBN
0-7803-4538-X
Type
conf
DOI
10.1109/IIT.1999.812084
Filename
812084
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