DocumentCode
3408807
Title
A technique for the production of multiple, large, mass analysed ribbon ion beams
Author
Aitken, Derek
Author_Institution
Superion Ltd., UK
Volume
1
fYear
1999
fDate
1999
Firstpage
196
Abstract
An ion source for the production of very uniform multiple ribbon beams combined with a mass analysis technique giving mass analysis of beams of any size or number leads to a machine technology capable of producing extremely high current, but low current density, ion beams. Low energy mass analysed implants up to 100 mA, Flat Panel Display implants with extremely large multiple beams and multi-amp oxygen implants will be possible with this new technology
Keywords
beam handling techniques; ion accelerators; ion implantation; ion optics; ion sources; particle beam diagnostics; Flat Panel Display implants; ion source; machine technology; mass analysis technique; multiple large mass analysed ribbon ion beams production; Electrodes; Implants; Ion beams; Ion sources; Magnetic analysis; Magnetic separation; Mass production; Particle beam optics; Particle separators; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location
Kyoto
Print_ISBN
0-7803-4538-X
Type
conf
DOI
10.1109/IIT.1999.812086
Filename
812086
Link To Document