Ion implanter with a magnetic neutral loop discharge (NLD) plasma ion source for surface modification

An ion implanter, the ULVAC ILD-600, which employs a new broad-beam ion source termed a “magnetic neutral loop discharge (NLD) plasma ion source” has been developed. NLD plasma is a high density rf plasma produced in a magnetically neutral loop formed using two coaxial permanent magnets. The accelerating voltage of this ion source is 1-60 kV, its maximum ion beam current density is 50 μ A/cm ², the effective diameter of the irradiated substrate area is 200 mm, and the uniformity of the ion beam is ±10%. Available ion species include N₂⁺, O₂⁺ and other gaseous ions. In order to carry out ion beam dynamic mixing for surface modification of precision molds, this ion implanter is equipped with an electron beam evaporator. TiN film with a Vickers hardness of 2000 was synthesized by N₂ gas assisted ion beam dynamic mixing