Enhancements to the Eaton GSD200 beamline for low energy boron operation

Enhancements to existing high current ion implanter beamlines can extend the use of this equipment to provide an operational bridge to the technology node of 0.18 μm. Through iterative improvements, the Eaten GSD200 has been modified to provide 4.5 times the beam current originally available for low energy boron production. This equipment uniquely supports modifications to the beam transport optics due to the design of the triple index analyzing magnet. In addition, space charge neutralization methods and beamline length reductions provide enhanced performance. Low energy boron beam current results and considerations for operation of traditional high current equipment at sub-10 keV will also be explored