• DocumentCode
    3409876
  • Title

    A new developed in-line dose monitor

  • Author

    Hisamune, T. ; Niikura, K. ; Kimura, N. ; Yokoo, H. ; Nishihashi, T. ; Kashimoto, K. ; Samurada, Y. ; Kitamura, T. ; Takeshita, M. ; Yajima, T. ; Yasaka, M.

  • Author_Institution
    ULVAC Japan Ltd., Kanagawa, Japan
  • Volume
    1
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    411
  • Abstract
    For the new generation ion implantation, a standard criterion in order to evaluate the uniformity and the absolute dose for low dose implantation down to 1E11/cm2 is indispensable. A dose monitor of multi-Faraday type has been developed and incorporated into the newly released ion implanter IW-series, This monitor realizes in-line calibration over the wide energy range from several hundred to several keV. The system structure and characteristics will be discussed
  • Keywords
    calibration; ion implantation; particle beam diagnostics; semiconductor device manufacture; semiconductor doping; absolute dose; in-line dose monitor; low dose implantation; multi-Faraday type monitor; uniformity; Cathodes; Density measurement; Ion implantation; Mass production; Measurement standards; Monitoring; Pollution measurement; Scanning probe microscopy; Semiconductor device manufacture; Standards development;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology Proceedings, 1998 International Conference on
  • Conference_Location
    Kyoto
  • Print_ISBN
    0-7803-4538-X
  • Type

    conf

  • DOI
    10.1109/IIT.1999.812141
  • Filename
    812141
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3409876