Title :
A new developed in-line dose monitor
Author :
Hisamune, T. ; Niikura, K. ; Kimura, N. ; Yokoo, H. ; Nishihashi, T. ; Kashimoto, K. ; Samurada, Y. ; Kitamura, T. ; Takeshita, M. ; Yajima, T. ; Yasaka, M.
Author_Institution :
ULVAC Japan Ltd., Kanagawa, Japan
Abstract :
For the new generation ion implantation, a standard criterion in order to evaluate the uniformity and the absolute dose for low dose implantation down to 1E11/cm2 is indispensable. A dose monitor of multi-Faraday type has been developed and incorporated into the newly released ion implanter IW-series, This monitor realizes in-line calibration over the wide energy range from several hundred to several keV. The system structure and characteristics will be discussed
Keywords :
calibration; ion implantation; particle beam diagnostics; semiconductor device manufacture; semiconductor doping; absolute dose; in-line dose monitor; low dose implantation; multi-Faraday type monitor; uniformity; Cathodes; Density measurement; Ion implantation; Mass production; Measurement standards; Monitoring; Pollution measurement; Scanning probe microscopy; Semiconductor device manufacture; Standards development;
Conference_Titel :
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-4538-X
DOI :
10.1109/IIT.1999.812141
