Current status of the extended life source: lifetime and performance improvements

Author

Horsky, T.N. ; Chen, J. ; Reynolds, W.E. ; Jones, M.A.

Author_Institution

Semicond. Equip. Oper., Eaton Corp., Beverly, MA, USA

Volume

1

fYear

1999

fDate

1999

Firstpage

416

Abstract

The Extended Lifetime Source (ELS) is an indirectly-heated cathode Bernas ion source originally designed for Eaten´s high energy implanter, but is also used on GSD/200 high current and 8250P medium current tools. It features very long service lifetime in production, and enhanced multiply-charged performance. We present source lifetime data demonstrating a recent improvement of a factor of two in lifetime. Production lifetimes for a high energy triple-well implant chain and a high current chain are presented. We discuss fundamental ion source operation, showing different operating modes for generating B, BF₂, Sb, and Ge beams, and discuss the operation of the indirectly-heated cathode

Keywords

ion implantation; ion sources; semiconductor device manufacture; semiconductor doping; 8250P medium current tool; Extended Lifetime Source; GSD/200 high current tool; enhanced multiply-charged performance; extended life source; high current chain; high energy triple-well implant chain; indirectly-heated cathode; indirectly-heated cathode Bernas ion source; lifetime; performance improvements; source lifetime data; very long service lifetime in production; Cathodes; Design engineering; Electron emission; Heating; Implants; Ion sources; Production; Reliability engineering; Thermal variables control; Thermionic emission;

fLanguage

English

Publisher

ieee

Conference_Titel

Ion Implantation Technology Proceedings, 1998 International Conference on

Conference_Location

Kyoto

Print_ISBN

0-7803-4538-X

Type

conf

DOI

10.1109/IIT.1999.812142

Filename

812142