DocumentCode :
3410626
Title :
Wafer contamination and particles resulting from cooling-pad elastomer
Author :
LaFontaine, Marvin ; Alvarado, Daniel
Author_Institution :
Ion Technol. Products, Genus Inc., Newburyport, MA, USA
Volume :
1
fYear :
1999
fDate :
1999
Firstpage :
590
Abstract :
A new, ultrapure silicone formulation recently introduced by Genus contains extremely low amounts of impurities. Front- and back-side levels of contaminants were measured on wafers which were implanted aboard a wheel outfitted with disks coated with the new silicone. The levels were exceedingly low. Levels of backside particles and residual oil on wafers were reduced by pre-conditioning the silicone. The pre-conditioning treatment consists of implanting the silicone itself with phosphorus (P). The implant recipe was determined by using a factorial design-of-experiment (DOE) approach. The independent variables were beam current, energy, and dosage. The dependent variables were particle counts and wafer-cooling power. The resulting implant recipe required some compromise between reduction of contaminants and cooling power of the elastomer
Keywords :
cooling; elastomers; impurities; ion implantation; semiconductor doping; surface contamination; Genus; back-side contaminants levels; backside particles; beam current; cooling-pad elastomer; dosage; energy; factorial design-of-experiment approach; front-side contaminants levels; impurities; particle counts; particles; pre-conditioning treatment; residual oil; ultrapure silicone formulation; wafer contamination; wafer-cooling power; Cooling; Curing; Filters; Implants; Magnetic separation; Particle measurements; Petroleum; Pollution measurement; Surface contamination; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-4538-X
Type :
conf
DOI :
10.1109/IIT.1999.812185
Filename :
812185
Link To Document :
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