DocumentCode
341066
Title
Progress in CMOS integrated measurement systems
Author
Baltes, Henry ; Brand, Oliver
Author_Institution
Phys. Electron. Lab., Eidgenossische Tech. Hochschule, Zurich, Switzerland
Volume
1
fYear
1999
fDate
1999
Firstpage
54
Abstract
Selected micro- and nanosystems developed recently at the authors´ laboratory are reviewed: (i) a fluxgate microsystem for detection of the Earth´s magnetic field, (ii) a capacitive chemical sensor microsystem for detection of volatile organic compounds in air, and (iii) a parallel scanning AFM chip. The micro- and nanosystems combine sensor structures and readout circuitry on a single chip and are fabricated using industrial CMOS technology in combination with post-processing micromachining and film deposition
Keywords
CMOS integrated circuits; air pollution measurement; atomic force microscopy; capacitive sensors; fluxgate magnetometers; force sensors; gas sensors; micromachining; microsensors; nanotechnology; CMOS integrated measurement systems; Earth´s magnetic field detection; VOC detection in air; capacitive chemical sensor; compass system; differential sensor; film deposition; fluxgate microsystem; force sensor; microsystems; nanosystems; parallel scanning AFM chip; post-processing micromachining; readout circuitry; sigma-delta modulator; single chip; CMOS technology; Chemical sensors; Circuits; Earth; Gas detectors; Magnetic field measurement; Magnetic sensors; Nanostructures; Semiconductor device measurement; Volatile organic compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Instrumentation and Measurement Technology Conference, 1999. IMTC/99. Proceedings of the 16th IEEE
Conference_Location
Venice
ISSN
1091-5281
Print_ISBN
0-7803-5276-9
Type
conf
DOI
10.1109/IMTC.1999.776719
Filename
776719
Link To Document