DocumentCode :
341118
Title :
Resonant magnetic field microsensors in standard CMOS technology
Author :
Baglio, Salvatore ; Latorre, Laurent ; Nouet, Pascal
Author_Institution :
Catania Univ., Italy
Volume :
1
fYear :
1999
fDate :
1999
Firstpage :
452
Abstract :
In this paper micromachined sensors for the estimation of magnetic field are presented. These devices have been realized through a MEMS technology based on a standard CMOS process coupled with an IC compatible post-processing phase. Different mechanical structures have been realized and studied. In particular the resonant working mode of the system has been taken into account. Particular attention has been devoted to the characterization of the interfering input effects Suitable models have been defined to allow meaningful numerical simulation of the electro-mechanical device
Keywords :
CMOS integrated circuits; digital simulation; identification; magnetic field measurement; micromachining; microsensors; IC compatible postprocessing; MEMS technology; electro-mechanical device; estimation of magnetic field; mechanical structures; micromachined sensors; numerical simulation; resonant magnetic field microsensors; resonant working mode; standard CMOS process; standard CMOS technology; CMOS integrated circuits; CMOS process; CMOS technology; Magnetic fields; Magnetic resonance; Magnetic sensors; Mechanical sensors; Micromechanical devices; Microsensors; Semiconductor device modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Instrumentation and Measurement Technology Conference, 1999. IMTC/99. Proceedings of the 16th IEEE
Conference_Location :
Venice
ISSN :
1091-5281
Print_ISBN :
0-7803-5276-9
Type :
conf
DOI :
10.1109/IMTC.1999.776793
Filename :
776793
Link To Document :
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