• DocumentCode
    3412137
  • Title

    Simulation of wafer scale diagnosis

  • Author

    Iychettira, A. ; Laforge, L.E.

  • Author_Institution
    Dept. of Electr. Eng., Nevada Univ., Reno, NV, USA
  • fYear
    1995
  • fDate
    22-25 Oct. 1995
  • Firstpage
    163
  • Abstract
    Summary form only given. DWI (Diagnosis of Wafer Scale Integrated Circuits), is a DOS C/sup ++/ program whose purpose is to assess the practicality of system-level diagnosis on a wafer scale. On the manufacturing line, diagnosis offers a replacement for probe test. For in-the-field operation, diagnosis holds promise for increasing the accuracy whereby faulty elements are identified, at reduced cost. With all of these applications, diagnosis eliminates or greatly reduces the need of external test equipment. The increasing prevalence of monolithic and multichip wafer scale modules may accelerate the search for alternatives to probe and scan. DWI can help the designer answer architectural questions such as: 1) What is the effect of the element failure rate and distribution of failures? 2) What is the best diagnosis algorithm?.
  • Keywords
    circuit analysis computing; failure analysis; fault diagnosis; integrated circuit reliability; wafer-scale integration; DOS C/sup ++/ program; DWI; diagnosis algorithm; failure distribution; failure rate; faulty element identification; manufacturing line; monolithic wafer scale modules; multichip wafer scale modules; system-level diagnosis; wafer scale diagnosis simulation; wafer scale integrated circuits; Acceleration; Circuit faults; Circuit simulation; Circuit testing; Costs; Displays; Fault diagnosis; Manufacturing; Probes; Test equipment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop, 1995. Final Report., International
  • Conference_Location
    Lake Tahoe, CA, USA
  • Print_ISBN
    0-7803-2705-5
  • Type

    conf

  • DOI
    10.1109/IRWS.1995.493600
  • Filename
    493600