Title :
Analyses of ohmic contacts to GaAs based microwave HBTs
Author :
Jones, K.A. ; Hilton, K.P. ; Crouch, M.A. ; Hughes, B.T. ; Cole, M.W. ; Han, W.Y.
Author_Institution :
US Army Res. Lab., Fort Monmouth, NJ, USA
Abstract :
Summary form only given. We compare the electrical, physical, and chemical properties of TiPdAu and PdGeTiPt contacts for GaAs HBTs. Contact and specific contact resistances are measured using the TLM method and devices made with the two different types of emitter contacts are compared, the surface structures are examined using optical and scanning electron microscopy, and the chemical structures are investigated with Auger and transmission electron microscopy. In addition, comparisons are made between the TiPdAu and PdGeTiPt contacts to heavily C-doped GaAs. The advantages of being able to substitute PdGeTiPt contacts for TiPdAu are that all of the contacts could be made with a single metallization, and the Pt would be a more effective diffusion barrier to the in-diffusion of Au.
Keywords :
III-V semiconductors; contact resistance; gallium arsenide; heterojunction bipolar transistors; microwave bipolar transistors; ohmic contacts; semiconductor device metallisation; Auger microscopy; GaAs microwave HBTs; GaAs:C-PdGeTiPt; GaAs:C-TiPdAu; TLM method; chemical properties; chemical structures; contact resistances; diffusion barrier; electrical properties; heavily C-doped GaAs; metallization; ohmic contacts; optical microscopy; physical properties; scanning electron microscopy; specific contact resistances; surface structures; transmission electron microscopy; Electrical resistance measurement; Gallium arsenide; Gold; Heterojunction bipolar transistors; Microwave devices; Ohmic contacts; Palladium; Platinum; Surface structures; Titanium compounds;
Conference_Titel :
High Performance Electron Devices for Microwave and Optoelectronic Applications, 1995. EDMO., IEEE 1995 Workshop on
Conference_Location :
London, UK
Print_ISBN :
0-7803-2537-0
DOI :
10.1109/EDMO.1995.493688