DocumentCode :
3414718
Title :
A study of acoustoelectric effect in GaAs by fabricating interdigital transducer using electron beam lithography technique
Author :
Abedin, M.N. ; Han, K.J. ; Das, P.
Author_Institution :
Rensselaer, Polytech. Inst., Troy, NY, USA
fYear :
1988
fDate :
2-5 Oct 1988
Firstpage :
229
Abstract :
Transverse acoustoelectric voltage (TAV) of Te-doped GaAs and n-GaAs/SI GaAs samples with photon energy and bias voltage is demonstrated. GaAs electronic properties were investigated using a surface acoustic wave (SAW) technique. The TAV was monitored across the GaAs sample by fabricating the interdigital transducer directly on the GaAs surface using electron beam lithography. In the processing, to protect the surface from contamination, the metal lift-off technique is also used. The TAV is developed due to the nonlinear interaction between the electric field accompanying SAW, and the free carriers near the GaAs surface. The TAV spectra are obtained to determining the bandgap energy and the Te-level which is observed at 300 K. It is also noticed that the TAV amplitude changes with bias voltage under the room illumination. However, when the illumination is turned off, the TAV does not change with bias voltage
Keywords :
III-V semiconductors; acoustoelectric effects; acoustoelectric transducers; electron beam lithography; gallium arsenide; surface acoustic wave devices; surface acoustic waves; GaAs; GaAs:Te; acoustoelectric; bandgap energy; bias voltage; electron beam lithography; interdigital transducer; metal lift-off; room illumination; surface acoustic wave; Acoustic transducers; Acoustic waves; Acoustoelectric effects; Electron beams; Gallium arsenide; Lighting; Monitoring; Surface acoustic waves; Surface contamination; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium, 1988. Proceedings., IEEE 1988
Conference_Location :
Chicago, IL
Type :
conf
DOI :
10.1109/ULTSYM.1988.49373
Filename :
49373
Link To Document :
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