Title :
Performance investigation on the reconfigurable Si nanowire schottky barrier transistors
Author :
Juncheng Wang ; Gang Du ; Zhiyuan Lun ; Kangliang Wei ; Lang Zeng ; Xiaoyan Liu
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
fDate :
Oct. 29 2012-Nov. 1 2012
Abstract :
In this paper, the performance of the reconfigurable Si nanowire Schottky barrier transistors (RFETs) is investigated with simulation method. In contrast to conventional Schottky barrier MOSFETs (SB-MOSFETs) and silicon nanowire transistors (Si-NWTs) with metal/silicide as source/drain, the separate two gates in RFETs are located at the two Schottky junctions. Our simulation results show the variable electric characteristics and working principle of the RFETs working as p-/n-type. The RFETs exhibit higher on/off current ratio compared with other Schottky transistors.
Keywords :
Schottky barriers; elemental semiconductors; field effect transistors; nanowires; silicon; RFET; Schottky barrier transistors; Schottky junctions; Si; electric characteristics; metal/silicide; on/off current ratio; p-/n-type; reconfigurable Si nanowire; silicon nanowire transistors; source/drain; Electric variables; Junctions; Logic gates; Schottky barriers; Silicides; Silicon; Transistors;
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2012 IEEE 11th International Conference on
Conference_Location :
Xi´an
Print_ISBN :
978-1-4673-2474-8
DOI :
10.1109/ICSICT.2012.6467586