• DocumentCode
    3415438
  • Title

    Investigations of junctionless nanowire transistors with non-uniform channel

  • Author

    Yunxi Zhu ; Haijun Lou ; Binghua Li ; Xinnan Lin

  • Author_Institution
    Shenzhen Grad. Sch., Key Lab. of Integrated Microsyst., Peking Univ., Shenzhen, China
  • fYear
    2012
  • fDate
    Oct. 29 2012-Nov. 1 2012
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    In this paper, the effects of non-uniform channel (NUC) in junctionless nanowire transistors (JNTs) are investigated and compared with those in inversion-mode field effect transistors (IMFETs) using three-dimensional simulations. The results show that, the variation of threshold voltage Vt in JNTs is 1.7 times of that in IMFETs and the fluctuation of off-state current Ioff is 2.8 times, which is mainly because that JNTs have bulk conduction channels and higher doping concentration in the channels. Hence, the process fluctuation for JNTs must be 30% or even smaller of that for IMFETs for similar performance variation. Furthermore, we conclude a formula based on the results to limit the variation of channel width.
  • Keywords
    doping; field effect transistors; fluctuations; nanowires; IMFET; JNT; NUC; bulk conduction channels; channel width; doping concentration; inversion-mode field effect transistors; junctionless nanowire transistors; nonuniform channel; off-state current fluctuation; performance variation; process fluctuation; three-dimensional simulations; threshold voltage; Doping; Electric fields; Fluctuations; Leakage current; Logic gates; Threshold voltage; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2012 IEEE 11th International Conference on
  • Conference_Location
    Xi´an
  • Print_ISBN
    978-1-4673-2474-8
  • Type

    conf

  • DOI
    10.1109/ICSICT.2012.6467591
  • Filename
    6467591