DocumentCode :
3415874
Title :
RF LDMOS design based on modified CMOS process
Author :
Ting Yu ; Dajie Zeng ; Nan Liu ; Xuejiao Chen ; Zhizhen Yin ; Yaohui Zhang ; Fuhua Yang
Author_Institution :
Inst. of Semicond., Beijing, China
fYear :
2012
fDate :
Oct. 29 2012-Nov. 1 2012
Firstpage :
1
Lastpage :
3
Abstract :
Two types of RF LDMOS devices are developed by introducing LDMOS process to standard CMOS fab. The basic device structure is described and the load pull test setup was put up to evaluate the RF performance of both devices. Besides, an impedance transformer was utilized to minimize the mismatch between system and device impedance as well as increase measurement accuracy. The first type is 50V RF LDMOS device which achieves 100W saturated output power for one cell with power density of 1.16 W/mm at 1 GHz. The other one is 28V broadband LDMOS, which achieves a power of 30W with 73% power added efficiency at 1 GHz and 55% power added efficiency at 2 GHz without internal matching network.
Keywords :
CMOS integrated circuits; impedance convertors; integrated circuit design; integrated circuit manufacture; integrated circuit testing; radiofrequency integrated circuits; CMOS; RF LDMOS design; complementary metal-oxide-semiconductor integrated circuits; frequency 1 GHz; frequency 100 GHz; frequency 2 GHz; impedance transformer; internal matching network; load pull test setup; power 100 W; power 30 W; voltage 28 V; voltage 50 V; Broadband communication; Impedance; Logic gates; Performance evaluation; Power generation; Radio frequency; Tuners;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2012 IEEE 11th International Conference on
Conference_Location :
Xi´an
Print_ISBN :
978-1-4673-2474-8
Type :
conf
DOI :
10.1109/ICSICT.2012.6467620
Filename :
6467620
Link To Document :
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