Title : 
A marvelous low on-resistance 20V rated self alignment trench MOSFET (SAT-MOS) in a 0.35μm LSI design rule with both high forward blocking voltage yield and large current capability
         
        
            Author : 
Narazaki, A. ; Takano, K. ; Oku, K. ; Hamachi, H. ; Minato, T.
         
        
            Author_Institution : 
Mitsubishi Electr. Co., Fukuoka, Japan
         
        
        
        
        
        
            Abstract : 
In this paper, we propose the SAT-MOS, which achieved marvelous performance of the specific on-resistance (Ron, sp): 6.5 mΩmm2 (@Vdss=30.8 V) by minimizing the unit cell pitch on a 0.35 μm LSI design rule. This is the lowest value of 20 V rated MOSFETs ever been reported. The fabricated SAT-MOS Ron,sp ratio to the Si limit reaches the ultimate value of 208% in this voltage class. The SAT-MOS maintains an excellent Vdss uniformity on a wafer, because our proposed SAC (shallow trench contact) structure and procedure has a very large process window for SAC trench depth if the source contact trench depth disperses more than 20%. As a result, we could present the SAT-MOS, which has both a large current capability of over 100 A/mm2 in a static forward bias condition and an avalanche ruggedness of over 25 A/mm2 during unclamped inductive switching (UIS).
         
        
            Keywords : 
power MOSFET; 0.35 micron; 20 V; 30.8 V; LSI design rule; SAC trench depth; SAT-MOS; avalanche ruggedness; high forward blocking voltage yield; large current capability MOSFET; low on-resistance MOSFET; self alignment trench MOSFET; shallow trench contact structure; source contact trench depth; specific on-resistance; static forward bias condition; unclamped inductive switching; unit cell pitch minimization; wafer Vdss uniformity; Power MOSFETs;
         
        
        
        
            Conference_Titel : 
Power Semiconductor Devices and ICs, 2004. Proceedings. ISPSD '04. The 16th International Symposium on
         
        
            Print_ISBN : 
4-88686-060-5
         
        
        
            DOI : 
10.1109/ISPSD.2004.1332956