Title :
30V sub-micron shallow junction planar-MOSFET for DC-DC converters
Author :
Ono, Syotaro ; Yamaguchi, Yoshihiro ; Kawaguchi, Yusuke ; Nakagawa, Akio
Author_Institution :
Discrete Semicond. Div., Toshiba Corp. Semicond. Co., Kawasaki, Japan
Abstract :
We present sub-micron shallow p-base planar-DMOSFETs (DMOS: double diffused MOSFET type) for DC-DC converter applications. The shallow junction depth is quite useful to reduce the device on-resistance. It was found that the gate-drain feedback charge can effectively be reduced by adopting a very narrow and shallow JFET region with very high JFET donor concentration, based on the charge compensation theory. An experimental planar DMOSFET with p-base depth of 0.8 μm exhibited a breakdown voltage of 34 V, an Ron*Qgd of 14.9 mΩnC, and good UIS capability. This is the best value ever reported for a 30 V planar DMOSFET structure.
Keywords :
DC-DC power convertors; charge compensation; power MOSFET; semiconductor device breakdown; 0.8 micron; 30 V; 34 V; DC-DC converters; DMOS; UIS capability; breakdown voltage; charge compensation theory; double diffused MOSFET; gate-drain feedback charge reduction; high JFET donor concentration; junction depth; narrow JFET region; on-resistance reduction; p-base planar-DMOSFET; shallow JFET region; shallow junction MOSFET; DC-DC power conversion; Power MOSFETs;
Conference_Titel :
Power Semiconductor Devices and ICs, 2004. Proceedings. ISPSD '04. The 16th International Symposium on
Print_ISBN :
4-88686-060-5
DOI :
10.1109/ISPSD.2004.1332958