Title :
Application of feed-forward and feedback control to a photolithography sequence
Author :
Leang, Sovarong ; Spanos, Costas J.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
fDate :
30 Sep-1 Oct 1992
Abstract :
Describe the implementation of supervisory control of three photolithography machines: a spincoat and bake track, a stepper and a developer. The objective of the experiment was to improve the reproducibility of critical dimensions of photoresist patterns. The results showed that the supervisory controller is capable of bringing the lithography process back to its previous specifications, even after all three machines have been taken down for maintenance and repairs
Keywords :
SCADA systems; photolithography; process control; critical dimensions; developer; feedback control; feedforward control; lithography process; photolithography sequence; photoresist patterns; reproducibility; spincoat/bake track; stepper; supervisory control; Adaptive control; Feedback control; Feedforward systems; Lithography; Predictive models; Reflectivity; Reproducibility of results; Resists; Semiconductor device modeling; Thickness measurement;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1992. ASMC 92 Proceedings. IEEE/SEMI 1992
Conference_Location :
Cambridge, MA
Print_ISBN :
0-7803-0740-2
DOI :
10.1109/ASMC.1992.253780
