DocumentCode
3417935
Title
Application of feed-forward and feedback control to a photolithography sequence
Author
Leang, Sovarong ; Spanos, Costas J.
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
fYear
1992
fDate
30 Sep-1 Oct 1992
Firstpage
143
Lastpage
147
Abstract
Describe the implementation of supervisory control of three photolithography machines: a spincoat and bake track, a stepper and a developer. The objective of the experiment was to improve the reproducibility of critical dimensions of photoresist patterns. The results showed that the supervisory controller is capable of bringing the lithography process back to its previous specifications, even after all three machines have been taken down for maintenance and repairs
Keywords
SCADA systems; photolithography; process control; critical dimensions; developer; feedback control; feedforward control; lithography process; photolithography sequence; photoresist patterns; reproducibility; spincoat/bake track; stepper; supervisory control; Adaptive control; Feedback control; Feedforward systems; Lithography; Predictive models; Reflectivity; Reproducibility of results; Resists; Semiconductor device modeling; Thickness measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop, 1992. ASMC 92 Proceedings. IEEE/SEMI 1992
Conference_Location
Cambridge, MA
Print_ISBN
0-7803-0740-2
Type
conf
DOI
10.1109/ASMC.1992.253780
Filename
253780
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